On October 14, ASML announced the latest development of lithography products. TWINSCAN NXE:3600D As the most advanced lithography system in its current research and development, the final specification has been finalized. Specifically speaking, the exposure speed of 30 MJ / cm2 can reach 160 wafers per hour, which improves the productivity by 18%, and improves the machine matching and registration accuracy to 1.1nm < / P > < p > 3600d, which is scheduled to be delivered in the middle of 2021. Customers still need some time to wait, and the price should not be lower than the $120 million of the current old model. Currently, the most advanced lithography machine that ASML has put into production is 3400c, but the main shipping model is 3400b. In terms of parameters, the precision of 3400b is 2nm, the exposure speed is 20mj / cm2, and 125 wafers can be exposed per hour. < p > < p > in addition, ASML revealed that 3400b also completed the software upgrade in the third quarter. New DUV lithography TWINSCAN NXT:2050i The verification has been completed in the third quarter, and the official shipment began in the early fourth quarter. The report shows that the number of app store purchases soared in the first half of this year due to the impact of covid-19