In the Third International Fair, ASML, a lithography giant, also participated in the exhibition, and displayed DUV lithography on its own stand. It is reported that the reason why ASML did not display the new EUV lithography machine is mainly because they are still unable to export EUV lithography machines to China, and the DUV lithography machines on display can produce process chips of 7Nm and above. < p > < p > ASML has also brought its overall lithography solution, including advanced control capability of lithography machine stage calculation lithography and measurement. Through modeling, simulation, analysis and other technologies, the edge positioning accuracy is continuously improved. < / P > < p > before that, ASML CFO Roger dassen talked about the business with China’s customers such as SMIC international in a video interview at the financial report meeting. He said that in some cases, the export of photolithography machines does not require a license.

  Roger Dassen pointed out that ASML understands the current rules and regulations of the U.S. authorities and their interpretation, and of course, that these are closely related to specific Chinese customers, but a broad understanding of the overall meaning of its rules and regulations for ASML (for specific Chinese customers) means that ASML will be able to provide DUV lithography systems to these Chinese customers from the Netherlands without an export license. < / P > < p > the United States only restricts the United States from exporting chips and lithography machines to China, but it does not restrict other countries from importing to China. The Netherlands is not within the scope of the US ban. < / P > < p > the current lithography machine is mainly divided into EUV and DUV. DUV lithography machine is divided into dry type and liquid immersion type. Among them, liquid immersion lithography was born in the hands of ASML. Although its wavelength is 193nm, it is equivalent to 134nm. After multiple exposure, the liquid immersion lithography machine can also achieve 7Nm process. However, each additional exposure will greatly increase the manufacturing cost, and the yield is difficult to control. Using 13.5nm light source, EUV lithography is an indispensable tool to break through 10nm chip process node. In other words, even if DUV (deep ultraviolet) lithography can be replaced by Nikon and canon, the 5nm production lines of chip giants TSMC, Samsung and Intel will not be put into production without ASML EUV lithography machine. Skip to content