After the semiconductor technology enters 7Nm, EUV lithography machine has become a must-have weapon for military strategists. Only ASML company can produce it in the world, with a unit price of 1 billion yuan. However, in terms of EUV technology, ASML is not necessarily the first, with fewer patents than Samsung. South Korean media reported that in recent years, Korean enterprises and scientific research institutions have invested heavily in EUV lithography, and the patent technology is narrowing the gap with foreign companies. < / P > < p > it is reported that among the patent applications from 2011 to 2020, the number of patent applications related to EUV lithography submitted to the Korea Intellectual Property Office (KIPO) reached a peak of 88, reaching 55 in 2018 and 50 in 2019. < p > < p > among them, in 2019, the number of EUV patent applications filed by local companies in South Korea was 40, more than 10 from abroad, which was also the first time that South Korea submitted more EUV patents than foreign companies. < / P > < p > in 2020, South Korean companies have submitted more than twice as many EUV patent applications as foreign companies, among which Samsung is the largest. This year, the company has started to use the 5nm EUV process to produce mobile phone processors. < / P > < p > from a global perspective, top 6 manufacturers applied for 59% of all EUV patents, of which Carl Zeiss accounted for 18% (after all, optical objective lens is the core of EUV), ranking first, followed by Samsung, with patent applications accounting for 18%, and ASML accounting for 11%, ranking third. In terms of specific technical projects, 32% of the patents applied for process technology, 31% for exposure device technology, 28% for mask technology and 9% for other patents. < p > < p > in the field of light mask, S & s technology in South Korea accounts for 28%, Hoya in Japan accounts for 15%, Hanyang University accounts for 10%, Asahi Glass accounts for 10% and Samsung Electronics accounts for 9%. Chinese version of K-car: reading a10e design drawing exposure